に同じ書籍を注文されています。
再度ご注文されますか?
著者:Taur, Yuan/Ning, Tak H.
【重要事項説明】
1. | 手配先によって価格が異なります。 |
2. | 納期遅延や入手不能となる場合がございます。 |
3. | 海外のクリスマス休暇等、お正月等の長期休暇時期の発注は、納期遅延となる場合がございます。 |
4. | 天候(国内・海外)により空港の発着・貨物受入不能の発生により納期遅延となる場合がございます。 |
5. | 複数冊数のご注文の場合、分納となる場合がございます。 |
6. | 美品のご指定は承りかねます。 |
A thoroughly updated third edition of an classic and widely adopted text, perfect for practical transistor design and in the classroom. Covering a variety of recent developments, the internationally renowned authors discuss in detail the basic properties and designs of modern VLSI devices, as well as factors affecting performance. Containing around 25% new material, coverage has been expanded to include high-k gate dielectrics, metal gate technology, strained silicon mobility, non-GCA (Gradual Channel Approximation) modelling of MOSFETs, short-channel FinFETS, and symmetric lateral bipolar transistors on SOI. Chapters have been reorganized to integrate the appendices into the main text to enable a smoother learning experience, and numerous additional end-of-chapter homework exercises (+30%) are included to engage students with real-world problems and test their understanding. A perfect text for senior undergraduate and graduate students taking advanced semiconductor devices courses, and for practicing silicon device professionals in the semiconductor industry. ・Updated throughout to cover a variety of recent developments, including FinFETs and fully-depleted SOI devices ・Integrated appendices to allow for a smoother reading experience ・Added homework exercises at the end of chapters in order to engage students with real-life problems and test their understanding
商品コード:1033192011
出版社: Cambridge University Press
出版年月:
2021/12
ISBN-10: 1108480020
ISBN-13: 978-1-108-48002-4
出版国: イギリス
装丁: hardcover/Geb./rel.
媒体: 冊子
ページ数: 622 p.
ジャンル: